AMPEL Special Seminar
Wafer-‐Scale Nanofabrication of Fluidic Microchips for Detecting and Controlling Single DNA Molecules
Abstract
Precision health care is poised to transform what we know about staying healthy, treating diseases and how health care is delivered. The foundation of precision health care is the genomic makeup of each individual. Scientific and technological advances in recent years have made it possible to sequence a human genome in 1-‐2 days and at a relatively low cost of a few thousands of US dollars. However, accurate, rapid and direct sequencing of long deoxyribonucleic acid (DNA) sequences remains elusive. In this talk, I will give an overview of our efforts to develop nanometer-‐scale silicon chips (DNA chips) for accurate, rapid and direct sequencing of long DNA sequences using the current integrated circuit (IC) manufacturing infrastructure. I will present fabrication of nanostructured fluidic devices of critical dimensions as small as 10 nm using either optical lithography or a combination of optical lithography and electron-‐beam lithography in a 200 mm wafer nanofabrication line. Dynamics of long DNA translocation through these nanofluidic devices will be discussed.
Speaker Bio
Dr. Qinghuang Lin is a Research Staff Member, a manager at IBM Thomas J. Watson Research Center in Yorktown Heights, New York. He received his B.E. and M.S. degrees from Tsinghua University, Beijing, China and his Ph.D. degree from the University of Michigan—Ann Arbor. He was a post-‐doctoral fellow with Professor C. Grant Willson at the University of Texas at Austin prior to joining IBM. An IBM Master Inventor, Dr. Lin holds more than 90 issued US patents. He is a recipient of 26 IBM Invention Plateau Achievement Awards. His inventions have been adopted in the mass production of advanced microchips for high-‐performance computers and some of the most popular mobile devices. In 2002, Dr. Lin, along with colleagues, received an IBM Research Division Award for "invention, development and implementation of 248 nm bilayer resist technology in manufacturing." This IBM 248 nm bilayer resist technology was part of the 40 years of innovations in semiconductor technology that won IBM the 2004 US National Medal of Technology -‐-‐ the highest honor awarded by the President of the United States to America's leading innovators. In 2015, Dr. Lin, along with colleagues, received an IBM Research Division Outstanding Achievement Award for “Spin-‐Torque Transfer Magnetic Random Access Memory (STT-‐MRAM).” In 2016, he, along with colleagues, received an IBM Research Division Achievement Award for “contributions to fundamental understanding of line edge roughness in semiconductor technology.” In 2014, Dr. Lin was named a Fellow of the American Chemical Society (ACS Fellow). In 2015, he was named a Fellow of the Division of Polymeric Materials Science and Engineering (PMSE), American Chemical Society (PMSE Fellow). In 2017, he was named a Fellow of the International Society for Optical and Photonics Engineering (SPIE Fellow). Dr. Lin served as the Chair of the American Chemical Society: Polymeric Materials Science and Engineering (PMSE) division in 2016. A frequent organizer and speaker of professional conferences at ACS, MRS, SPIE and SEMI, Dr. Lin is the editor or co-‐editor of 7 books and 9 conference proceedings volumes and the author and co-‐author of over 70 technical papers. He is an Associate Editor of Journal of Micro/Nanolithography, MEMS, and MOEMS and served as a Guest Editor of Journal of Materials Research focus issue on self-‐assembly and directed assembly of advanced materials.